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DFB InP Process Scaled to 150 mm (6”) 

Kelvin Nanotechnology (KNT) has developed a Distributed Feedback (DFB) grating process on 150 mm (6”) InP platform. The work was done in collaboration with the James Watt Nanofabrication Centre (JWNC) and IQE plc (Cardiff, Wales).

Kelvin Nanotechnology (KNT) has developed a Distributed Feedback (DFB) grating process on 150 mm (6”) InP platform. This enables our customers to produce the high-volume laser solutions which rapid growth in optical data links will require. The work was done in collaboration with the James Watt Nanofabrication Centre (JWNC) and IQE plc (Cardiff, Wales). 

Kelvin Nanotechnology is a leading supplier of nanofabrication services for prototyping and production and is the commercial arm of the James Watt Nanofabrication Centre at the University of Glasgow.

 As a pioneer in InP technology, IQE’s data infrastructure semiconductor materials are qualified across a diverse range of transceiver platforms. Demonstrating that InP is scalable will not only enable the step change in output which will be required to satisfy rapid growth in demand for DFB lasers, but also enable optical interconnect technology to remain cost competitive as network traffic scales.

Dr Brendan Casey, CEO of Kelvin Nanotechnology commented:

“We are delighted to be able to demonstrate a DFB grating technology fully deployed on a 6” InP platform with high yield and uniformity and we look forward to working with IQE in bringing this capability to the market.”

Dr. Mark J. Furlong, Executive Vice President of Business Development of IQE commented:

‘’We are pleased to be able to offer our data infrastructure customers an industry first, DFB laser epitaxy on a 150 mm (6”) InP wafer platform.  Scaling our current laser materials technology to deliver a fab-ready service at 150 mm (6”) provides our customers an immediate competitive advantage and faster time to market.”

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