The JWNC continues to receive significant financial support from the University of Glasgow growing the technical capability in key areas. In the past year, an Oxford Instruments ICP180 plasma etch tool designed for III-V etching, a multi-source plassys electron beam evaporator, a chemical mechanical polisher and wafer scriber have been installed. Funds have been secured through a recent capex bid to build on the existing dry etch and lithography capability within the centre. New equipment due to arrive mid-2013 include a deep silicon ICP etch tool and laser lithography system.
We are excited to be exhibiting at SPIE Photonics West 2024.
KNT can be found at the UK Pavilion Booth 5017, at the Moscone Center on the 30th of January to the 2nd of February.
Please stop by our booth to see what is new in nanofabrication and quantum device fabrication.