KNT have collaborated with the University of Huddersfield in the production of metasurface optics for metrology applications.
This work has been reported in publications such as:
J.H.T. Chan, D. Tang, J. Williamson, H. Martin, A.J. Henning, X. Jiang. An ultra-compact metasurface-based chromatic confocal sensor.
CIRP Annals – Manufacturing Technology, (2023) Volume 72, Issue 1, Pages 465-468. https://doi.org/10.1016/j.cirp.2023.04.002.
X. Jiang, A.J. Henning. Precision metrology: from bulk optics towards metasurface optics.
Contemporary Physics, (2021), Volume 62, No. 4, Pages 199-216. https://doi.org/10.1080/00107514.2022.2101745
The high-resolution and direct-write capability of electron beam lithography makes it an efficient patterning technique for the
prototyping and development of metasurface devices.
For further details of our capability in this area, please contact us at enquiries@kntnano.com
